At ElectraMet, we are changing the way industries think about wastewater. Instead of relying on chemical-heavy methods that generate hazardous sludge, our electrochemical process makes it possible to remove contaminants, recover valuable metals, and neutralize oxidants—all directly on-site.
As CEO Keith Jacobs and CTO Dr. James Landon explained in their recent conversation with HG Ventures, the company’s mission is clear: close the loop between waste and value. Whether in semiconductor fabs, battery recycling plants, or aerospace facilities, ElectraMet turns a cost center into a source of savings and sustainability.
Founded in 2014, ElectraMet grew from a breakthrough in residential water treatment into an industrial-scale solution for some of the world’s most pressing wastewater challenges. Today, our membrane-free, chemical-free systems are gaining traction across global industries, especially semiconductors and lithium-ion battery recycling.
The impact is real. Customers have reduced contaminants, cut hauling costs, recovered valuable materials, and improved safety. By enabling companies to recycle and reuse water and chemistry, our technology helps shrink environmental footprints while delivering measurable ROI.
Adoption has required education and collaboration, as electrochemical approaches are still new to many industries. Through strong customer partnerships and practical support, at ElectraMet, we have consistently demonstrated the value of our technology.
Looking ahead, our company is expanding internationally and scaling our oxidant abatement solutions, which may one day rival metals recovery in impact. For Jacobs and Landon, the vision goes beyond business growth:
It’s about building a legacy of innovation, sustainability, and leadership in industrial water treatment.
Our wastewater treatment methods exemplify what HG Ventures calls “investing in disruption for good.” By transforming wastewater into opportunity, we are setting a new standard for how industries handle one of their most critical resources.