Why Peroxide Control Is the Hidden Lever in Sustainable RCA Cleaning

Opening Reality Check

In today’s advanced-node semiconductor fabs, cleaning isn’t a back-office cost; it’s a strategic bottleneck. As device geometries shrink and connection densities rise, each cleaning step becomes more frequent and more waste-intensive. Every pass generates effluent, chemical load, and downstream treatment cost.

That means: the industry must clean more, not less; so the path to sustainability and cost control runs through how we manage cleaning waste, not just how we execute the cleaning.

The Role of Oxidants in RCA (SC1 / SC2) Cleaning

In RCA cleaning processes (SC1/SC2) used widely in preparatory wafer cleaning, oxidants such as hydrogen peroxide (H₂O₂) play a key role in removing organics and metal residues. But they also set off a chain reaction of consequences:

  • Residual oxidants destabilize acids or cleaning baths and limit reuse. 
  • High oxidant loads complicate downstream treatment, causing higher TSS, increased chemical neutralization, or more frequent hauling. 
  • Each cleaning step with oxidants increases the burden on your wastewater/effluent system.

     

     

In short: cleaning chemistry might be well-known, but how you manage the oxidant by-product is often overlooked.

The Sustainability Constraint in Cleaning

As you increase cleaning frequency (which is inevitable), oxidant load goes up, and the consequences show up in cost, CO₂, and environmental impact. Consider these connected risks:

  • More hauling or external treatment = higher OPEX & logistics footprint.
  • More chemical replacements = higher upstream supply-chain risk and cost.
  • Greater CO₂e per cleaning step = negative flag in ESG reporting.

     

     

If you treat cleaning as a fixed cost center, you miss the strategic opportunity: controlling oxidants means controlling the waste cascade of cleaning.

Electrochemical Abatement as an Enabler

This is where the strategic lever appears: managing oxidants through electrochemical systems (such as those offered under the ElectraMet / ARRO™ framework) enables you to:

  • Neutralize oxidants in-line, reducing load on downstream treatment.
  • Stabilize acids and cleaning baths so that they can be reused on-site, rather than treated and hauled away.
  • Lower the chemical and logistical dependency of cleaning waste management.

Put differently: by controlling oxidants you unlock acid reuse, waste reduction, and resource circularity, turning cleaning from cost liability into sustainability advantage.

Strategic Payoff for Executives

When executives frame cleaning optimization through the oxidant lever, the outcome moves from “we must comply” to “we gain advantage.”

  • Reduced hauling and treatment cost: oxidant control lowers treatment burden and the need for external hauling.
  • Improved CO₂e and ESG metrics: each cleaning step becomes leaner and less wasteful; this shows up in sustainability dashboards.
  • Stronger supply-chain resilience: less dependence on new chemicals, less subcontract logistics.
  • Competitive differentiation: as others wrestle with rising cleaning waste and cost, those who mastered oxidants get ahead.


Now is the time to act. Because as node sizes shrink further and connection densities spike, cleaning waste will only expand; the opportunity to get in ahead of the curve is now, not later.

Final Reality Check

Controlling peroxide and other oxidants isn’t just a chemical step; it’s the strategic foundation for circular cleaning in next-generation fabs. If cleaning is becoming more frequent, more intensive, and more scrutinized from ESG and cost standpoints, then oxidant control isn’t optional. It’s a high-impact lever, and the ones who adopt it early gain the advantage.

Discover how on-site oxidant abatement and acid reuse are transforming cleaning economics. Download the executive brief or contact our team for a pilot readiness assessment.

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